Waveguide-mode interference lithography technique for high contrast subwavelength structures in the visible region

摘要

We explore possibilities of waveguide-mode interference lithography (WMIL)technique for high contrast subwavelength structures in the visible region.Selecting an appropriate waveguide-mode, we demonstrate high contrast resistmask patterns for the first time. TM1 mode in the waveguide is shown to beuseful for providing a three-dimensional structure whose cross section ischeckerboard pattern. Applying our WMIL technique, we demonstrate 1D, 2D and 3Dsubwavelength resist patterns that are widely used for the fabrication ofmetamteterials in the visible region. In addition to the resist patterns, wedemonstrate a resonance at 1.9 eV for a split tube structure experimentally.